Application Note 43176. To determine ultra-trace metal concentrations in semiconductor grade nitric acid (HNO3). Demonstrate the use of cold plasma (CP) and kinetic energy discrimination (KED) to reduce background equivalent concentrations (BEC) and improve detection limits (LoD). Demonstrate the use of the iCAP Qs ICP-MS to perform reproducible ultra-trace ng/L (ppt) measurements of semiconductor relevant elements in nitric acid.
United States
